Acid Resistant

Introduction

Featuring a cleanroom-grade enclosed design and a rotary cleaning mechanism, the system can process up to 100 wafers per batch, ensuring efficient and stable cleaning quality.

永技企業3吋至6吋晶圓旋轉式超音波清洗機,採無塵密閉設計與旋轉清洗機構,適用半導體晶圓蝕刻後清潔
永技企業3吋至6吋晶圓旋轉式超音波清洗機,採無塵密閉設計與旋轉清洗機構,適用半導體晶圓蝕刻後清潔

3-inch to 6-inch Wafer Rotary Etching

Technical Advantages
  • Special loading rack

  • Rotary product cleaning

  • PFA, PVDF, HDPE, and PP materials

  • Circulation filtration system

  • Cleanroom-grade or explosion-proof model

Introduction

YONG JI multi-tank acid-resistant cleaning machines are manufactured with acid-resistant plastic materials such as PP and PVDF, providing excellent corrosion resistance and long-term stability. They are specially designed for acidic chemical solutions or chemical processing applications. The equipment operates with a multi-tank staged cleaning process, with each tank independently controlling temperature, processing time, and circulation filtration. The filtration and circulation system helps maintain the cleanliness of the cleaning solution and prevents cross-contamination. Cleanroom-grade or explosion-proof models are also available according to environmental requirements.

永技企業晶圓蝕刻超音波清洗機,採用PP、PVDF耐酸塑膠材質與多槽設計,專為半導體與化學製程酸性藥液清洗應用
永技企業晶圓蝕刻超音波清洗機,採用PP、PVDF耐酸塑膠材質與多槽設計,專為半導體與化學製程酸性藥液清洗應用

Wafer Etching Cleaning Machine

Technical Advantages
  • Acid-resistant design

  • PFA, PVDF, HDPE, and PP materials

  • Multi-function cleaning processes can be customized according to requirements

    1. Ultrasonic Cleaning

    2. Water Rinsing

    3. Air Knife Drying

    4. Hot Air Drying

  • Modular design available

  • Minimized cross-contamination

  • Can be equipped with filtration and circulation systems

  • Cleanroom-grade or explosion-proof models available

  • Easy maintenance

永技企業輸送帶式耐酸清洗線,支援連續清洗流程與高防腐蝕結構設計,適用化學與製程產業
永技企業輸送帶式耐酸清洗線,支援連續清洗流程與高防腐蝕結構設計,適用化學與製程產業
永技企業實驗室用手動耐酸清洗機,採PP、PVDF耐酸材質製造,適用化學實驗與小批量清洗作業
永技企業實驗室用手動耐酸清洗機,採PP、PVDF耐酸材質製造,適用化學實驗與小批量清洗作業
永技企業直立式耐酸清洗機,採高密封多槽設計,適用於半導體與光電製程酸液清洗。
永技企業直立式耐酸清洗機,採高密封多槽設計,適用於半導體與光電製程酸液清洗。
永技企業無塵室等級耐酸清洗槽,具防爆與循環過濾系統,符合無塵室精密製程需求
永技企業無塵室等級耐酸清洗槽,具防爆與循環過濾系統,符合無塵室精密製程需求